Center for Advanced Materials Processing Research
Colloid and Surface Technologies:
Colloidal Dispersions and Processing
- Polymer blends and foams
- Surfactants, liquid crystals and gels
- Colloidal catalysts
- Sols
Colloidal Dispersions and Processing Publications
Nanosystems
- Nano-particle synthesis
- Nano-composites
- Self-assembly
- Biomaterials and biological systems
Multimedia software on Nanomaterials
Particle Transport, Deposition and Removal
- Modeling of fluid flows
- Flow visualization
- Wet particulate cleaning processes
Particle Transport, Deposition and Removal Publications
Chemical-Mechanical Planarization (CMP)
- Metal & dielectric film polishing
- Abrasives
- Role of chemical & tool parameters
- Post-CMP cleaning
- Modeling of fluid flow and heat and mass transfer
- Integration issues
Particle Synthesis and Properties
- Uniform micro- and nanoparticle synthesis
- Inorganic/organic composites
- Optical, magnetic and electrical properties
- Adhesion and coagulation
Particle Synthesis and Properties Publications
Thin Films and Coatings
- Coated particles and fibers
- CVD and PECVD
- Adhesion
Thin Films and Coatings Publications
Supporting Technologies
- Microstructural characterization
- Instrumental techniques
- Processing of dispersions

CMP at CAMP
"Clarkson has become an international leader in several aspects of CMP research. We have an interdisciplinary research team of engineers and scientists collaborating on CMP research at CAMP that has led to innovations in materials and methods that have been adopted by the semiconductor industry." Dr. S.V. Babu, CAMP Director
Read more about CMP at CAMP here.








